Chemical Vapor Deposition

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Top Articles

#	Title	Journal	Year	Citations
1	Review of CVD Synthesis of Graphene	Chemical Vapor Deposition	2013	468
2	A Kinetic Model for Step Coverage by Atomic Layer Deposition in Narrow Holes or Trenches	Chemical Vapor Deposition	2003	329
3	The CVD of Nanodiamond Materials	Chemical Vapor Deposition	2008	314
4	Perfectly Conformal TiN and Al2O3 Films Deposited by Atomic Layer Deposition	Chemical Vapor Deposition	1999	271
5	Ruthenium Thin Films Grown by Atomic Layer Deposition	Chemical Vapor Deposition	2003	249
6	Large‐Scale Synthesis of Few‐Layered Graphene using CVD	Chemical Vapor Deposition	2009	209
7	Atomic Layer Deposition of Photocatalytic TiO2 Thin Films from Titanium Tetramethoxide and Water	Chemical Vapor Deposition	2004	204
8	Processing and Applications of Aerosol-Assisted Chemical Vapor Deposition	Chemical Vapor Deposition	2006	202
9	Atomic Layer Deposition of Hafnium Dioxide Films from Hafnium Tetrakis(ethylmethylamide) and Water	Chemical Vapor Deposition	2002	192
10	Chemical vapor deposition of metals: Part 1. An overview of CVD processes	Chemical Vapor Deposition	1995	178
11	Metal Chalcogenide Materials: Chalcogenolato complexes as “single-source” precursors	Chemical Vapor Deposition	1996	172
12	CVD Growth of MoS₂‐based Two‐dimensional Materials	Chemical Vapor Deposition	2015	167
13	A Short History of Atomic Layer Deposition: Tuomo Suntola's Atomic Layer Epitaxy	Chemical Vapor Deposition	2014	166
14	Growth Per Cycle in Atomic Layer Deposition: A Theoretical Model	Chemical Vapor Deposition	2003	163
15	Recent and Expected Roles of Plasma‐Polymerized Films for Biomedical Applications	Chemical Vapor Deposition	2007	139
16	Atomic Layer Deposition of Ruthenium Thin Films from Ru(thd)3 and Oxygen	Chemical Vapor Deposition	2004	137
17	Atomic Layer Deposition of CuxS for Solar Energy Conversion	Chemical Vapor Deposition	2003	136
18	Synthesis and Functional Properties of Vanadium Oxides: V2O3, VO2, and V2O5 Deposited on Glass by Aerosol-Assisted CVD	Chemical Vapor Deposition	2007	136
19	Vanadium Oxide Compounds: Structure, Properties, and Growth from the Gas Phase	Chemical Vapor Deposition	2014	135
20	Synthesis, Properties, and Applications of Ferromagnetic-Filled Carbon Nanotubes	Chemical Vapor Deposition	2006	133
21	Volatile Metal β-Diketonates: ALE and CVD precursors for electroluminescent device thin films	Chemical Vapor Deposition	1997	131
22	Thin Films with Nanotextures for Transparent and Ultra Water-Repellent Coatings Produced from Trimethylmethoxysilane by Microwave Plasma CVD	Chemical Vapor Deposition	2002	131
23	MOCVD of Chalcogenides, Pnictides, and Heterometallic Compounds from Single-Source Molecule Precursors	Chemical Vapor Deposition	2000	124
24	Reaction Mechanism Studies on Titanium Isopropoxide–Water Atomic Layer Deposition Process	Chemical Vapor Deposition	2002	119
25	Raman Studies of Nano‐ and Ultra‐nanocrystalline Diamond Films Grown by Hot‐Filament CVD	Chemical Vapor Deposition	2010	116
26	CVD in Hot Wall Reactors—The Interaction Between Homogeneous Gas-Phase and Heterogeneous Surface Reactions	Chemical Vapor Deposition	1998	115
27	Molecular Layer Deposition of Hybrid Organic‐Inorganic Polymer Films using Diethylzinc and Ethylene Glycol	Chemical Vapor Deposition	2009	113
28	Nanocoating Individual Silica Nanoparticles by Atomic Layer Deposition in a Fluidized Bed Reactor	Chemical Vapor Deposition	2005	111
29	Nanocrystalline Titania Films and Particles by Chemical Vapor Synthesis	Chemical Vapor Deposition	2000	109
30	Thin Polymer Films with High Step Coverage in Microtrenches by Initiated CVD	Chemical Vapor Deposition	2008	107
31	Atomic Layer Deposition of SrTiO3 Thin Films from a Novel Strontium Precursor-Strontium-bis(tri-isopropyl cyclopentadienyl)	Chemical Vapor Deposition	2001	105
32	The World of Carbon Nanotubes: An Overview of CVD Growth Methodologies	Chemical Vapor Deposition	2006	105
33	Fabrication of High-Purity, Double-Walled Carbon Nanotube Buckypaper	Chemical Vapor Deposition	2006	101
34	Low-Temperature ALE Deposition of Y2O3 Thin Films from β-Diketonate Precursors	Chemical Vapor Deposition	2001	97
35	Growth Per Cycle in Atomic Layer Deposition: Real Application Examplesof a Theoretical Model	Chemical Vapor Deposition	2003	95
36	Low-Temperature Deposition of Zirconium Oxide-Based Nanocrystalline Films by Alternate Supply of Zr[OC(CH3)3]4 and H2O	Chemical Vapor Deposition	2000	94
37	Novel Mononuclear Alkoxide Precursors for the MOCVD of ZrO2 and HfO2 Thin Films	Chemical Vapor Deposition	2002	94
38	Film Uniformity in Atomic Layer Deposition	Chemical Vapor Deposition	2006	93
39	Fabrication and Characterization of 3C-SiC-Based MOSFETs	Chemical Vapor Deposition	2006	89
40	Chemical Vapor Deposition Enhanced by Atmospheric Pressure Non-thermal Non-equilibrium Plasmas	Chemical Vapor Deposition	2005	87
41	Diffusion Barrier Deposition on a Copper Surface by Atomic Layer Deposition	Chemical Vapor Deposition	2002	86
42	Anhydrous Metal Nitrates as Volatile Single Source Precursors for the CVD of Metal Oxide Films	Chemical Vapor Deposition	1998	85
43	Very High Yield Growth of Vertically Aligned Single-Walled Carbon Nanotubes by Point-Arc Microwave Plasma CVD	Chemical Vapor Deposition	2005	85
44	4H SiC Epitaxial Growth with Chlorine Addition	Chemical Vapor Deposition	2006	82
45	Pure and mixed phase Bi2O3 thin films obtained by metal organic chemical vapor deposition	Chemical Vapor Deposition	1996	81
46	Atomic Layer Deposition of Iron Oxide Thin Films and Nanotubes using Ferrocene and Oxygen as Precursors	Chemical Vapor Deposition	2008	78
47	Phase-Selective Deposition and Microstructure Control in Iron Oxide Films Obtained by Single-Source CVD	Chemical Vapor Deposition	2002	77
48	Formation of Continuous Nanocrystalline Diamond Layers on Glass and Silicon at Low Temperatures	Chemical Vapor Deposition	2008	77
49	Atmospheric Pressure Process for Coating Particles Using Atomic Layer Deposition	Chemical Vapor Deposition	2009	77
50	Catalytic Production of Carbon Nanotubes by Fluidized‐Bed CVD	Chemical Vapor Deposition	2007	76

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