2.9(top 6%)
Impact Factor
3(top 6%)
extended IF
152(top 2%)
H-Index
3.9K
authors
16.7K
papers
309.8K
citations
3.3K
citing journals
58.8K
citing authors

Most Cited Articles of Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

TitleYearCitations
Microstructural evolution during film growth20031.3K
Structural analysis of Si(111)‐7×7 by UHV‐transmission electron diffraction and microscopy19851.2K
Nanosphere lithography: A materials general fabrication process for periodic particle array surfaces19951.2K
Theory of ripple topography induced by ion bombardment19881.1K
The search for novel, superhard materials19991K
The microstructure of sputter‐deposited coatings19861K
Material selection for hard coatings1986962
Titanium aluminum nitride films: A new alternative to TiN coatings1986794
Sculptured thin films and glancing angle deposition: Growth mechanics and applications1997776
Characterization of diamondlike carbon films and their application as overcoats on thin‐film media for magnetic recording1987775
Revised structure zone model for thin film physical structure1984749
Infrared spectroscopic study of SiOx films produced by plasma enhanced chemical vapor deposition1986699
Glancing angle deposition: Fabrication, properties, and applications of micro- and nanostructured thin films2007658
Raman scattering characterization of carbon bonding in diamond and diamondlike thin films1988627
GexSi1−x/Si strained‐layer superlattice grown by molecular beam epitaxy1984617
Infrared spectroscopy of Si(111) and Si(100) surfaces after HF treatment: Hydrogen termination and surface morphology1989613
Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges2011565
Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells2012535
Microfabrication of cantilever styli for the atomic force microscope1990535
UV/ozone cleaning of surfaces1985526
Gas-phase production of carbon single-walled nanotubes from carbon monoxide via the HiPco process: A parametric study2001520
Nature of the use of adventitious carbon as a binding energy standard1995509
Measuring the nanomechanical properties and surface forces of materials using an atomic force microscope1989501
High power impulse magnetron sputtering discharge2012477
Application of reflectance difference spectroscopy to molecular‐beam epitaxy growth of GaAs and AlAs1988473