0.7(top 50%)
impact factor
4.0K(top 5%)
papers
21.9K(top 10%)
citations
38(top 20%)
h-index
0.7(top 50%)
impact factor
4.0K
all documents
22.5K
doc citations
53(top 20%)
g-index
Top Articles
# | Title | Journal | Year | Citations |
---|---|---|---|---|
1 | Nematic homogeneous photo alignment by polyimide exposure to linearly polarized uv. | Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi] | 1995 | 179 |
2 | Photo- and Bio-degradable Polyesters. Photodegradation Behaviors of Aliphatic Polyesters | Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi] | 1997 | 108 |
3 | Mold Surface Treatment for Imprint Lithography. | Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi] | 2001 | 104 |
4 | Environmentally stable chemical amplification positive resist: principle, chemistry, contamination resistance, and lithographic feasibility. | Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi] | 1994 | 99 |
5 | Optical Properties of Fluorinated Polyimides and Their Applications to Optical Components and Waveguide Circuits | Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi] | 2004 | 97 |
6 | Optimizing Two-Photon Initiators and Exposure Conditions for Three-Dimensional Lithographic Microfabrication. | Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi] | 2001 | 87 |
7 | Liquid crystal alignment on photopolymer surfaces exposed by linearly polarized uv light. | Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi] | 1995 | 85 |
8 | Step and Flash Imprint Lithography: An Efficient Nanoscale Printing Technology. | Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi] | 2002 | 73 |
9 | Formation of Membrane-like Structures in Clotted Blood by Mild Plasma Treatment during Hemostasis | Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi] | 2013 | 73 |
10 | Nano-Patterning for Patterned Media using Block-Copolymer. | Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi] | 2002 | 67 |
11 | High Refractive Index Positive Tone Photo-sensitive Coating | Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi] | 2006 | 62 |
12 | Organosilane Monolayer Resists for Scanning Probe Lithography. | Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi] | 1997 | 61 |
13 | New Photoresist Based on Amorphous Low Molecular Weight Polyphenols | Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi] | 2004 | 59 |
14 | Sensitization Distance and Acid Generation Efficiency in a Model System of Chemically Amplified Electron Beam Resist with Methacrylate Backbone Polymer | Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi] | 2007 | 56 |
15 | Nanoparticle photoresists from HfO2 and ZrO2 for EUV patterning | Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi] | 2012 | 54 |
16 | Secondary Electrons in EUV Lithography | Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi] | 2013 | 53 |
17 | RESOLUTION AND ETCH RESISTANCE OF A FAMILY OF 193nm POSITIVE RESISTS | Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi] | 1995 | 52 |
18 | Topcoat Approaches for Directed Self-Assembly of Strongly Segregating Block Copolymer Thin Films | Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi] | 2013 | 52 |
19 | Mechanical Properties of Poly-methyl methacrylate (PMMA) for Nano Imprint Lithography | Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi] | 2003 | 50 |
20 | Refractive Indices and Thermo-Optic Coefficients of Aromatic Polyimides Containing Sulfur Atoms | Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi] | 2005 | 48 |
21 | Impact of 2-Methyl-2-Adamantyl Group Used for 193-nm Single-Layer Resist | Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi] | 1996 | 47 |
22 | Photo Alignment Materials with High Sensitivity to Near UV Light. | Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi] | 1998 | 47 |
23 | Plasma Treatment of Silk Fabrics for Better Dyeability. | Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi] | 2002 | 47 |
24 | Improved Lithographic Performance for EUV Resists Based on Polymers having a Photoacid Generator (PAG) in the Backbone | Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi] | 2005 | 47 |
25 | FET Characteristics of Dinaphthothienothiophene (DNTT) on Si/SiO2 Substrates with Various Surface-Modifications | Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi] | 2007 | 46 |
26 | Novel Noria (Water Wheel-Like Cyclic Oligomer) Derivative as a Chemically Amplified Extreme Ultraviolet (EUV)-Resist Material | Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi] | 2009 | 46 |
27 | Metal Oxide Nanoparticle Photoresists for EUV Patterning | Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi] | 2014 | 46 |
28 | 157 nm Resist Materials: A Progress Report. | Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi] | 2000 | 43 |
29 | The SMARTTM Process for Directed Block Co-Polymer Self-Assembly | Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi] | 2013 | 43 |
30 | Analysis on Deterioration Mechanism of Release Layer in Nanoimprint Process | Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi] | 2007 | 42 |
31 | Progress in EUV Resist Development | Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi] | 2007 | 42 |
32 | Current Status of EUV Photoresists | Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi] | 2003 | 41 |
33 | DFT Calculations on Refractive Index Dispersion of Fluoro-compounds in the DUV-UV-Visible Region | Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi] | 2006 | 40 |
34 | Application of Diamond-Like-Carbon Coating to a Coronary Artery Drug-Eluting Stent | Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi] | 2007 | 40 |
35 | Preparation and Properties of Dental Composite Resin Cured under Near Infrared Irradiation | Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi] | 2009 | 40 |
36 | Nanoparticle Photoresists: Ligand Exchange as a New, Sensitive EUV Patterning Mechanism | Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi] | 2013 | 40 |
37 | A Novel Polymer for a 193-nm Resist. | Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi] | 1996 | 39 |
38 | Relationship between Photodegradability and Biodegradability of Some Aliphatic Polyesters. | Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi] | 1999 | 39 |
39 | Investigation of Polymer-bound PAGs: Synthesis, Characterization and Initial Structure/Property Relationships of Anion-bound Resists | Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi] | 2009 | 39 |
40 | Photoinduced Phase Transitions in Rod-shaped Azobenzene with Different Alkyl Chain Length | Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi] | 2016 | 39 |
41 | Design of Photoacid Generating Systems | Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi] | 2009 | 38 |
42 | Novel Photoacid Generators. | Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi] | 2000 | 37 |
43 | A Decade of Step and Flash Imprint Lithography | Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi] | 2009 | 37 |
44 | New Protective Groups in Alicyclic Methacrylate Polymers for 193-nm Resists. | Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi] | 1997 | 36 |
45 | Resist Removal by using Atomic Hydrogen | Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi] | 2008 | 36 |
46 | Analysis of Thermal Radiation Properties of Polyimide and Polymeric Materials Based on ATR-IR spectroscopy | Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi] | 2016 | 36 |
47 | Recent Development in Photosensitive Polyimide (PSPI) | Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi] | 2001 | 35 |
48 | Functionalization of Biomedical Polymers by Means of Plasma Processes: Plasma Treated Polymers with Limited Hydrophobic Recovery and PE-CVD of -COOH Functional Coatings. | Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi] | 2002 | 35 |
49 | PEG-based Surface Modification on Upconversion Nanophosphors for Bio-imaging under IR Excitation | Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi] | 2006 | 35 |
50 | Novel Fluoropolymers for Use in 157nm Lithography. | Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi] | 2001 | 34 |