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Top Articles

#TitleJournalYearCitations
1Nematic homogeneous photo alignment by polyimide exposure to linearly polarized uv.Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi]1995179
2Photo- and Bio-degradable Polyesters. Photodegradation Behaviors of Aliphatic PolyestersJournal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi]1997108
3Mold Surface Treatment for Imprint Lithography.Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi]2001104
4Environmentally stable chemical amplification positive resist: principle, chemistry, contamination resistance, and lithographic feasibility.Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi]199499
5Optical Properties of Fluorinated Polyimides and Their Applications to Optical Components and Waveguide CircuitsJournal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi]200497
6Optimizing Two-Photon Initiators and Exposure Conditions for Three-Dimensional Lithographic Microfabrication.Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi]200187
7Liquid crystal alignment on photopolymer surfaces exposed by linearly polarized uv light.Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi]199585
8Step and Flash Imprint Lithography: An Efficient Nanoscale Printing Technology.Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi]200273
9Formation of Membrane-like Structures in Clotted Blood by Mild Plasma Treatment during HemostasisJournal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi]201373
10Nano-Patterning for Patterned Media using Block-Copolymer.Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi]200267
11High Refractive Index Positive Tone Photo-sensitive CoatingJournal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi]200662
12Organosilane Monolayer Resists for Scanning Probe Lithography.Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi]199761
13New Photoresist Based on Amorphous Low Molecular Weight PolyphenolsJournal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi]200459
14Sensitization Distance and Acid Generation Efficiency in a Model System of Chemically Amplified Electron Beam Resist with Methacrylate Backbone PolymerJournal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi]200756
15Nanoparticle photoresists from HfO2 and ZrO2 for EUV patterningJournal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi]201254
16Secondary Electrons in EUV LithographyJournal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi]201353
17RESOLUTION AND ETCH RESISTANCE OF A FAMILY OF 193nm POSITIVE RESISTSJournal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi]199552
18Topcoat Approaches for Directed Self-Assembly of Strongly Segregating Block Copolymer Thin FilmsJournal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi]201352
19Mechanical Properties of Poly-methyl methacrylate (PMMA) for Nano Imprint LithographyJournal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi]200350
20Refractive Indices and Thermo-Optic Coefficients of Aromatic Polyimides Containing Sulfur AtomsJournal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi]200548
21Impact of 2-Methyl-2-Adamantyl Group Used for 193-nm Single-Layer ResistJournal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi]199647
22Photo Alignment Materials with High Sensitivity to Near UV Light.Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi]199847
23Plasma Treatment of Silk Fabrics for Better Dyeability.Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi]200247
24Improved Lithographic Performance for EUV Resists Based on Polymers having a Photoacid Generator (PAG) in the BackboneJournal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi]200547
25FET Characteristics of Dinaphthothienothiophene (DNTT) on Si/SiO2 Substrates with Various Surface-ModificationsJournal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi]200746
26Novel Noria (Water Wheel-Like Cyclic Oligomer) Derivative as a Chemically Amplified Extreme Ultraviolet (EUV)-Resist MaterialJournal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi]200946
27Metal Oxide Nanoparticle Photoresists for EUV PatterningJournal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi]201446
28157 nm Resist Materials: A Progress Report.Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi]200043
29The SMARTTM Process for Directed Block Co-Polymer Self-AssemblyJournal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi]201343
30Analysis on Deterioration Mechanism of Release Layer in Nanoimprint ProcessJournal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi]200742
31Progress in EUV Resist DevelopmentJournal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi]200742
32Current Status of EUV PhotoresistsJournal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi]200341
33DFT Calculations on Refractive Index Dispersion of Fluoro-compounds in the DUV-UV-Visible RegionJournal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi]200640
34Application of Diamond-Like-Carbon Coating to a Coronary Artery Drug-Eluting StentJournal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi]200740
35Preparation and Properties of Dental Composite Resin Cured under Near Infrared IrradiationJournal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi]200940
36Nanoparticle Photoresists: Ligand Exchange as a New, Sensitive EUV Patterning MechanismJournal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi]201340
37A Novel Polymer for a 193-nm Resist.Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi]199639
38Relationship between Photodegradability and Biodegradability of Some Aliphatic Polyesters.Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi]199939
39Investigation of Polymer-bound PAGs: Synthesis, Characterization and Initial Structure/Property Relationships of Anion-bound ResistsJournal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi]200939
40Photoinduced Phase Transitions in Rod-shaped Azobenzene with Different Alkyl Chain LengthJournal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi]201639
41Design of Photoacid Generating SystemsJournal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi]200938
42Novel Photoacid Generators.Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi]200037
43A Decade of Step and Flash Imprint LithographyJournal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi]200937
44New Protective Groups in Alicyclic Methacrylate Polymers for 193-nm Resists.Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi]199736
45Resist Removal by using Atomic HydrogenJournal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi]200836
46Analysis of Thermal Radiation Properties of Polyimide and Polymeric Materials Based on ATR-IR spectroscopyJournal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi]201636
47Recent Development in Photosensitive Polyimide (PSPI)Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi]200135
48Functionalization of Biomedical Polymers by Means of Plasma Processes: Plasma Treated Polymers with Limited Hydrophobic Recovery and PE-CVD of -COOH Functional Coatings.Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi]200235
49PEG-based Surface Modification on Upconversion Nanophosphors for Bio-imaging under IR ExcitationJournal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi]200635
50Novel Fluoropolymers for Use in 157nm Lithography.Journal of Photopolymer Science and Technology = [Fotoporima Konwakai Shi]200134