1.6(top 50%)
impact factor
12.2K(top 2%)
papers
244.2K(top 2%)
citations
143(top 5%)
h-index
1.6(top 50%)
impact factor
12.2K
all documents
252.7K
doc citations
229(top 5%)
g-index
Top Articles
| # | Title | Journal | Year | Citations |
|---|---|---|---|---|
| 1 | GaN, AlN, and InN: A review | Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena | 1992 | 2,691 |
| 2 | Band offsets of wide-band-gap oxides and implications for future electronic devices | Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena | 2000 | 1,843 |
| 3 | Nanoimprint lithography | Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena | 1996 | 1,577 |
| 4 | Sub-10 nm imprint lithography and applications | Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena | 1997 | 1,033 |
| 5 | Critical Review: Adhesion in surface micromechanical structures | Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena | 1997 | 787 |
| 6 | Recent advances in processing of ZnO | Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena | 2004 | 619 |
| 7 | Mold-assisted nanolithography: A process for reliable pattern replication | Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena | 1996 | 617 |
| 8 | Growth of silicon nanowires via gold/silane vapor–liquid–solid reaction | Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena | 1997 | 616 |
| 9 | Focused ion beam technology and applications | Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena | 1987 | 540 |
| 10 | Microscopic uniformity in plasma etching | Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena | 1992 | 528 |
| 11 | Relaxed GexSi1−x structures for III–V integration with Si and high mobility two-dimensional electron gases in Si | Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena | 1992 | 510 |
| 12 | Atomic layer deposition of metal and nitride thin films: Current research efforts and applications for semiconductor device processing | Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena | 2003 | 499 |
| 13 | Advanced techniques for glancing angle deposition | Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena | 1998 | 477 |
| 14 | Determination of pore size distribution in thin films by ellipsometric porosimetry | Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena | 2000 | 472 |
| 15 | Dependence of the quality factor of micromachined silicon beam resonators on pressure and geometry | Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena | 1992 | 463 |
| 16 | Unified disorder induced gap state model for insulator–semiconductor and metal–semiconductor interfaces | Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena | 1986 | 441 |
| 17 | Adhesion and stiction: Mechanisms, measurement techniques, and methods for reduction | Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena | 2003 | 437 |
| 18 | Nanobubbles on solid surface imaged by atomic force microscopy | Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena | 2000 | 418 |
| 19 | Three-dimensional nanostructure fabrication by focused-ion-beam chemical vapor deposition | Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena | 2000 | 410 |
| 20 | Alteration of Cu conductivity in the size effect regime | Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena | 2004 | 407 |
| 21 | Nanofabrication by scanning probe microscope lithography: A review | Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena | 2005 | 404 |
| 22 | Structure shape and stability of nanometric sized particles | Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena | 2001 | 402 |
| 23 | Barrier heights of real Schottky contacts explained by metal-induced gap states and lateral inhomogeneities | Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena | 1999 | 400 |
| 24 | Tunneling spectroscopy of the GaAs(110) surface | Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena | 1987 | 395 |
| 25 | Single cell detection with micromechanical oscillators | Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena | 2001 | 393 |
| 26 | Low-temperature growth of silicon dioxide films: A study of chemical bonding by ellipsometry and infrared spectroscopy | Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena | 1987 | 375 |
| 27 | The advanced unified defect model for Schottky barrier formation | Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena | 1988 | 374 |
| 28 | High resolution atomic force microscopy potentiometry | Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena | 1991 | 373 |
| 29 | A review of laser–microchemical processing | Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena | 1983 | 359 |
| 30 | Explanation of the linear correlation between barrier heights and ideality factors of real metal-semiconductor contacts by laterally nonuniform Schottky barriers | Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena | 1997 | 355 |
| 31 | Damped oscillations in reflection high energy electron diffraction during GaAs MBE | Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena | 1983 | 354 |
| 32 | Micromachining applications of a high resolution ultrathick photoresist | Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena | 1995 | 352 |
| 33 | Step and flash imprint lithography: Template surface treatment and defect analysis | Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena | 2000 | 343 |
| 34 | Field emission properties of carbon nanotubes | Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena | 2000 | 328 |
| 35 | Characterization of thin layers on perfect crystals with a multipurpose high resolution x-ray diffractometer | Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena | 1983 | 317 |
| 36 | Photoemission study of energy-band alignments and gap-state density distributions for high-k gate dielectrics | Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena | 2001 | 317 |
| 37 | An investigation of the properties of cubic GaN grown on GaAs by plasma-assisted molecular-beam epitaxy | Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena | 1991 | 315 |
| 38 | Two-dimensional modeling of high plasma density inductively coupled sources for materials processing | Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena | 1994 | 314 |
| 39 | What can electron paramagnetic resonance tell us about the Si/SiO[sub 2] system? | Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena | 1998 | 314 |
| 40 | Clocking of molecular quantum-dot cellular automata | Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena | 2001 | 308 |
| 41 | Measurement of interfacial shear (friction) with an ultrahigh vacuum atomic force microscope | Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena | 1996 | 304 |
| 42 | The art and science and other aspects of making sharp tips | Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena | 1991 | 300 |
| 43 | On the mechanism of the hydrogen-induced exfoliation of silicon | Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena | 1997 | 298 |
| 44 | Metal ion deposition from ionized mangetron sputtering discharge | Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena | 1994 | 286 |
| 45 | Roller nanoimprint lithography | Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena | 1998 | 286 |
| 46 | Molecular-beam epitaxy growth of tilted GaAs/AlAs superlattices by deposition of fractional monolayers on vicinal (001) substrates | Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena | 1988 | 284 |
| 47 | Micromachined silicon sensors for scanning force microscopy | Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena | 1991 | 281 |
| 48 | Thermal stability and desorption of Group III nitrides prepared by metal organic chemical vapor deposition | Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena | 1996 | 272 |
| 49 | Diamond emitters fabrication and theory | Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena | 1996 | 270 |
| 50 | Extreme ultraviolet lithography | Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena | 1998 | 265 |