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Microelectronic Engineering
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Microelectronic Engineering
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Condensed Matter Physics
2.5
(top 7%)
Impact Factor
2.8
(top 7%)
extended IF
98
(top 4%)
H-Index
4.4K
authors
12.3K
papers
142.8K
citations
3.5K
citing journals
51.5K
citing authors
Most Cited Articles of Microelectronic Engineering
Title
Year
Citations
Fabrication of microstructures with high aspect ratios and great structural heights by synchrotron radiation lithography, galvanoforming, and plastic moulding (LIGA process)
1986
885
Carbon nanotubes in interconnect applications
2002
468
Nanofabrication by electron beam lithography and its applications: A review
2015
354
Towards implementation of a nickel silicide process for CMOS technologies
2003
349
Lab-on-a-chip devices: How to close and plug the lab?
2015
326
PDMS-based microfluidic devices for biomedical applications
2002
326
Point-of-care testing (POCT) diagnostic systems using microfluidic lab-on-a-chip technologies
2015
315
Optimization of poly-di-methyl-siloxane (PDMS) substrates for studying cellular adhesion and motility
2008
307
Flow behaviour of thin polymer films used for hot embossing lithography
2000
306
Ultrathin high-K metal oxides on silicon: processing, characterization and integration issues
2001
304
Imprint lithography with sub-10 nm feature size and high throughput
1997
303
Novel hydrogen gas sensor based on single ZnO nanorod
2008
270
Nanotribology and nanomechanics of MEMS/NEMS and BioMEMS/BioNEMS materials and devices
2007
269
On the scaling issues and high-κ replacement of ultrathin gate dielectrics for nanoscale MOS transistors
2006
262
Formation of more stable hydrophilic surfaces of PDMS by plasma and chemical treatments
2006
261
Ultrathin HfO2 films grown on silicon by atomic layer deposition for advanced gate dielectrics applications
2003
246
Measurement of nonlinear mechanical properties of PDMS elastomer
2011
231
NiSi salicide technology for scaled CMOS
2002
230
Hierarchical roughness makes superhydrophobic states stable
2007
223
Improving stamps for 10 nm level wafer scale nanoimprint lithography
2002
214
Roadmap for 22 nm and beyond (Invited Paper)
2009
207
Gold cleaning methods for electrochemical detection applications
2009
202
Direct laser writing: Principles and materials for scaffold 3D printing
2015
198
Fabrication and characterization of heterostructures with subnanometer thickness
1984
195
High-k dielectrics for future generation memory devices (Invited Paper)
2009
184
previous
2004
2005
2006
How are inpact factors calculated?
The impact factor (IF) is calculated by counting citations from peer-reviewed journals only.
extended IF
also counts citations from books and conference papers. However, no patent, abstract, working papers, online documents, etc., are covered.
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