| Pi-Gate SOI MOSFET | IEEE Electron Device Letters | 2001 | 168 |
| An experimentally validated analytical model for gate line-edge roughness (LER) effects on technology scaling | IEEE Electron Device Letters | 2001 | 103 |
| Interface induced uphill diffusion of boron: an effective approach for ultrashallow junction | IEEE Electron Device Letters | 2001 | 41 |
| Characterization and modeling of edge direct tunneling (EDT) leakage in ultrathin gate oxide MOSFETs | IEEE Transactions on Electron Devices | 2001 | 36 |
| Design methodologies for adaptive and multimedia networks | | 2001 | 27 |
| Thermal Stability of Sputtered Tungsten Carbide as Diffusion Barrier for Copper Metallization | Journal of the Electrochemical Society | 2001 | 26 |
| X-Ray Reflectivity and FTIR Measurements of N[sub 2] Plasma Effects on the Density Profile of Hydrogen Silsesquioxane Thin Films | Journal of the Electrochemical Society | 2001 | 26 |
| Improving the RF performance of 0.18 μm CMOS with deep n-well implantation | IEEE Electron Device Letters | 2001 | 24 |
| The effect of remote plasma nitridation on the integrity of the ultrathin gate dielectric films in 0.13 μm CMOS technology and beyond | IEEE Electron Device Letters | 2001 | 23 |
| Characterization of Sputtered Titanium Carbide Film as Diffusion Barrier for Copper Metallization | Journal of the Electrochemical Society | 2001 | 22 |
| Physical and Electrical Characteristics of Methylsilane- and Trimethylsilane-Doped Low Dielectric Constant Chemical Vapor Deposited Oxides | Journal of the Electrochemical Society | 2001 | 21 |
| Physical and Electrical Characteristics of F- and C-Doped Low Dielectric Constant Chemical Vapor Deposited Oxides | Journal of the Electrochemical Society | 2001 | 20 |
| Sampled-data modeling and analysis of one-cycle control and charge control | IEEE Transactions on Power Electronics | 2001 | 20 |
| A deep submicron CMOS process compatible suspending high-Q inductor | IEEE Electron Device Letters | 2001 | 19 |
| AN OBJECT-BASED DATA FLOW TESTING APPROACH FOR WEB APPLICATIONS | International Journal of Software Engineering and Knowledge Engineering | 2001 | 18 |
| RESOURCE-CONSTRAINED PROJECT MANAGEMENT USING MODIFIED THEORY OF CONSTRAINT | Journal of the Chinese Institute of Industrial Engineers | 2001 | 18 |
| Thermally-enhanced remote plasma nitrided ultrathin (1.65 nm) gate oxide with excellent performances in reduction of leakage current and boron diffusion | IEEE Electron Device Letters | 2001 | 18 |
| Modeling of Reverse Tone Etchback Shallow Trench Isolation Chemical Mechanical Polishing | Journal of the Electrochemical Society | 2001 | 13 |
| An adaptive fuzzy sliding-mode controller for servomechanism disturbance rejection | IEEE Transactions on Industrial Electronics | 2001 | 12 |
| A full Cu damascene metallization process for sub-0.18 /spl mu/m RF CMOS SoC high Q inductor and MIM capacitor application at 2.4 GHz and 5.3 GHz | | 2001 | 12 |
| Characterization of polysilicon resistors in sub-0.25 μm CMOS ULSI applications | IEEE Electron Device Letters | 2001 | 12 |
| Novel Polymeric Surfactants for Improving Chemical Mechanical Polishing Performance of Silicon Oxide | Electrochemical and Solid-State Letters | 2001 | 11 |
| Dielectric and Barrier Properties of Spin-On Organic Aromatic Low Dielectric Constant Polymers FLARE and SiLK | Journal of the Electrochemical Society | 2001 | 11 |
| Foundries and the dawn of an open IP era | Computer | 2001 | 9 |
| Nonsilicide source/drain pixel for 0.25-μm CMOS image sensor | IEEE Electron Device Letters | 2001 | 9 |
